Use of an atomic force microscope for the characterization of nanostructures and for lithography
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In this thesis two different lithography techniques are presented. The first is the self-assembly of diblock copolymers, where two different materials are mixed in such a way that they form self-assembled templates over a semiconductor surface. The second is lithography performed with an atomic force microscope, where the tip of the AFM is brought into contact with a surface to alter it. In both cases, the lithography patterns are characterized with an AFM. The goal of this work was to develop the necessary procedures and expertise to perform AFM lithography with Nanosurf AFMs and to fabricate structures using diblock copolymers.