Fabrication and characterization of micro- /nano structures for nanophotonic applications
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The objective of this thesis is finding and developing fabrication methods to provide background techniques for potential applications with nanomaterials. The inclined UV lithography has announced to make three-dimensional fabrication process. With a movable stage, complex structures were achieved but difference of the refractive index, design of the final structures were limited. Refractive index matching medium between the substrate and the light source could reduce the refractive indices between the polymer and the substrate successfully. Nanoporous structures fabricated by multibeam interference lithography shows limitation of the usage since its periodicity. By insertion of the lift off resist layer between the patterned layer and the substrate, final photonic crystal structures could be partially removed for its own purpose and it provide potential application in the future. Two-step processing, combining with reactive ion etching system, nanoporous structures were on various substrates such as silicon and Polydimethylsiloxane. Photonic crystal template anodic aluminum oxide process has been described too. Large optical activity at visible wavelengths are of great attention in photonics. Dramatic enhancement of the optical activity of chiral poly(fluorene-alt-benzothiadiazole) with photoresist was demonstrated and successive photo patterning of chiral polymer shows the potential usage of this material for the photonics applications. Two photon lithography also used to pattern a photoresist-chiral polymer mixture into planar shapes and enhanced chirality can be realized by tuning the wavelength-dependent chiral response at both the molecular and geometric level. Near infrared light induced photopolymerization in-situ was demonstrated which can be applied everywhere where ultraviolet-polymerization is employed such as dentistry, coating industry. Use of the ultraviolet upconverting nanoparticles doped into the polymer, we show that expensive femtosecond pulsed lasers can be replace with relatively cheap 980 nm laser diodes.